The coatings using LPPS-Hybrid systems close the gap between conventional thermal spray processes and thin film (PVD, CVD) processes.
The following elements comprise this system:
| Vertically oriented vacuum chamber |
| Very long plasma jet to coat large areas |
| Uses radically lower working pressures than traditional LPPS |
LPPS-Hybrid systems can produce coatings within three distinct regimes:
PS-PVD (Plasma Spray-PVD) can produce thick, columnar-structured YSZ coatings (100 to 300 µm) using high gun enthalpy to vaporize specific types of feedstock materials.
PS-CVD (Plasma Spray-CVD) uses modified conventional thermal spray components operated below 0.5 mbar to produce CVD-like coatings (<1 to 10 µm) at higher deposition rates by using liquid for gaseous precursors as feedstock materials.
PS-TF (Plasma Spray-Thin Film) can produce thin, dense layers from liquid splats using a classical thermal spray approach but at high velocity and enthalpy.
| LPPS Technology | ||||
| VPS / LPPS | PS-PVD | PS-CVD | PS-TF | |
| Chamber Pressure | 50 mbar | 1 mbar | 0.5 mbar | 1 mbar |
| Feedstock | Metals | Ceramics | Liquid & Gaseous Precursors | Metals, Ceramics |
| State of Deposit | Liquid | Vapor | Vapor | Liquid |
| Coating Example | MCrAlY | YSZ | SiOx | LSM |
Brochures
BRO-0005.6 An Introduction to Thermal Spray (EN)
BRO-0002.13 Thermal Spray Equipment Guide (EN)
Case Studies
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