The coatings using LPPS-Hybrid systems close the gap between conventional thermal spray processes and thin film (PVD, CVD) processes.
The following elements comprise this system:
|Vertically oriented vacuum chamber
|Very long plasma jet to coat large areas
|Uses radically lower working pressures than traditional LPPS
LPPS-Hybrid systems can produce coatings within three distinct regimes:
PS-PVD (Plasma Spray-PVD) can produce thick, columnar-structured YSZ coatings (100 to 300 µm) using high gun enthalpy to vaporize specific types of feedstock materials.
PS-CVD (Plasma Spray-CVD) uses modified conventional thermal spray components operated below 0.5 mbar to produce CVD-like coatings (<1 to 10 µm) at higher deposition rates by using liquid for gaseous precursors as feedstock materials.
PS-TF (Plasma Spray-Thin Film) can produce thin, dense layers from liquid splats using a classical thermal spray approach but at high velocity and enthalpy.
|VPS / LPPS
|Liquid & Gaseous Precursors
|State of Deposit