The coatings using LPPS-Hybrid systems close the gap between conventional thermal spray processes and thin film (PVD, CVD) processes.

The following elements comprise this system:

Vertically oriented vacuum chamber
Very long plasma jet to coat large areas
Uses radically lower working pressures than traditional LPPS

LPPS-Hybrid systems can produce coatings within three distinct regimes:

PS-PVD (Plasma Spray-PVD) can produce thick, columnar-structured YSZ coatings (100 to 300 µm) using high gun enthalpy to vaporize specific types of feedstock materials.

PS-CVD (Plasma Spray-CVD) uses modified conventional thermal spray components operated below 0.5 mbar to produce CVD-like coatings (<1 to 10 µm) at higher deposition rates by using liquid for gaseous precursors as feedstock materials.

PS-TF (Plasma Spray-Thin Film) can produce thin, dense layers from liquid splats using a classical thermal spray approach but at high velocity and enthalpy.

LPPS Technology
Chamber Pressure 50 mbar 1 mbar 0.5 mbar 1 mbar
Feedstock Metals Ceramics Liquid & Gaseous Precursors Metals, Ceramics
State of Deposit Liquid Vapor Vapor Liquid
Coating Example MCrAlY YSZ SiOx LSM


BRO-0005.6 An Introduction to Thermal Spray (EN)



BRO-0002.13 Thermal Spray Equipment Guide (EN)



Case Studies

SF-0014.2 ChamPro LPPS Hybrid Technologies for application of unique, high-performance functional surfaces (EN)



Get Information

Related Products
How can we help you?

You can reach us at mail address or by calling (0216) 307 71 55.

Contact us
(0216) 307 71 11 I want information